Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
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Contact Us
  • Contact Person : Ms. Zhao Alice
  • Company Name : Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
  • Tel : 86-10-82830276
  • Fax : 86-10-62923013
  • Address : Beijing,Beijing,Room1235,QingHeJiaYuan East Area armor 1st,Haidian District,Beijing,China
  • Country/Region : China
  • Zip : 100085

Products List
high purity Silicon (Si) pieces

high purity Silicon (Si) pieces

1.ISO9001:2008 2.Low impurity content 3.High density :99% min 4.Surface and tolerance: low crude salvation Item NameSilicon  (Si)  pieces for evaporation coatingPurity  99.999%,99.9999% Available dimensionsdiameter 4-6inch, Customization is...
High purity Siliver evarporation pellets 99.99% 99.999%

High purity Siliver evarporation pellets 99.99% 99.999%

1.size:dia2*5mm,as request 2.purity:99.999%,99.999% 3.Surface and tolerance: Low crude salvation 4.certificate: ISO9001:2008   Item NameHigh purity Silver (Ag) pelletsPurity99.99% 99.999% ShapeCylindrical, According to your requestAvailable sizeNormal...
AZO (ZnO+Al2O3) sputtering target 99.99%

AZO (ZnO+Al2O3) sputtering target 99.99%

1.High corrosion and heat resistance 2.Surface and tolerance: Low crude salvation 3.ISO9001:2008 Item NameAZO  (ZnO+Al2O3)   sputtering target ShapeSquare/Round, according to your requestAvailable sizeRound: dia 25~250mmRectangular: length up to...
High purity silicon dioxide (SiO2) sputtering target 99.99% 99.999%

High purity silicon dioxide (SiO2) sputtering target 99.99% 99.999%

1.High corrosion and heat resistance 2.Surface and tolerance: Low crude salvation 3.ISO9001:2008 Item NameHigh purity silicon dioxide sputtering target  Purity99.99%, 99.999%  ShapeSquare /round, according to your requestAvailable sizeRound: dia 25~250mmRectangular:...
Titanium Nitride (TiN) sputtering target 99.99%

Titanium Nitride (TiN) sputtering target 99.99%

1.High corrosion and heat resistance 2.Surface and tolerance: Low crude salvation 3.ISO9001:2008 Item NameTitanium Nitride (TiN) sputtering targetPurity99.99%ShapeSquare /round, according to your requestAvailable sizeRound: dia 25~250mmRectangular: length up to...
High purity Titanium Oxide (TiO2) Sputtering Target 99.99%

High purity Titanium Oxide (TiO2) Sputtering Target 99.99%

1.Relative Density : 99% at least 2.ISO9001:2008 3.Surface and tolerance: Low crude salvation 4.High corrosion and heat Item NameHigh purity Titanium Oxide (TiO2) Sputtering TargetShapeSquare/Round, according to your requestAvailable sizeRound: dia 25~250mmRectangular:...
Titanium Carbide (TiC) sputtering target 99.99%

Titanium Carbide (TiC) sputtering target 99.99%

1.ISO9001:2008 2.Low impurity content 3.High efficiency of space filling >99% 4.Surface and tolerance: low crude salvation Item NameTitanium Carbide sputtering target Purity  99.99% ShapeSquare /round, according to your requestAvailable sizeRound: dia...
High purity Aluminum nitride sputtering target 99.99%

High purity Aluminum nitride sputtering target 99.99%

1. High density >99% 2. High corrosion and heat resistance 3. Surface and tolerance: Low crude salvation 4. ISO9001:2008 Item NameHigh purity Aluminum Nitride sputtering target ShapeSquare/Round, according to your requestAvailable sizeRound: dia 25~250mmRectangular:...
High purity Indium Tin Oxide (ITO) target 99.99%

High purity Indium Tin Oxide (ITO) target 99.99%

1,High density >99% 2,High corrosion and heat resistance 3,Surface and tolerance: Low crude salvation 4,ISO9001:2008   Item NameHigh purity ITO target (In2O3:SnO2=90:10(wt%))Purity99.99% ShapeSquare/Round, According to your requestAvailable sizeRound: dia...
Titanium aluminum alloy sputtering target 99.99%

Titanium aluminum alloy sputtering target 99.99%

1. High density 2. Low impurity content 3. Microstructure:Uniform 4. Surface: Machine plane / Polished 5. ISO9001: 2008 Item NameHigh purity TiAl target (Ti:Al=50%:50% (wt%))Purity99.99% ShapeSquare/Round, According to your requestAvailable sizeRound: dia...



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